发明名称 LITHOGRAPHIC APPARATUS AND POSITION SENSOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a safety system for preventing a collision of a support with another parts, for a lithographic apparatus which has a stationary magnet motor for driving the support such as a substrate support or a patterning device support. <P>SOLUTION: A measurement system for measuring the position of the support. The measurement system measures a magnetic field strength of an alternating magnetic field generated by a magnet assembly of the stationary magnet motor, and/or measures generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measures light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009021590(A) 申请公布日期 2009.01.29
申请号 JP20080175140 申请日期 2008.07.04
申请人 ASML NETHERLANDS BV 发明人 VAN BRUGGEN OLAF HUBERTUS WILHELMUS;AUER FRANK;MARCEL KOENRAAD MARIE BAGGEN;VAN DER MEULEN FRITS;VOGELSANG PATRICK DAVID;REIJNEN MARTINUS CORNELIS;DASSEL JOHANNES ROLAND;NIHTIANOV STOYAN;WAKKER REMKO;ZUTPHEN TOM VAN
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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