发明名称 X-RAY DIFFRACTION MEASUREMENT APPARATUS AND X-RAY DIFFRACTION MEASUREMENT METHOD
摘要 PROBLEM TO BE SOLVED: To acquire biaxial residual stresses σx, σy, and τxy being parallel to a surface of a measuring object by a single measurement.SOLUTION: An X-ray diffraction measurement apparatus exits an X-ray having characteristic X-ray with at least two wavelengths to a measuring object OB such that the X ray is applied substantially perpendicularly to the surface of the measuring object OB, receives diffraction X-ray generated at the measuring object OB with an imaging plate 15, and forms two diffraction rings on the imaging plate 15. The X-ray diffraction measurement apparatus scans the laser light on the imaging plate 15 to detect the shapes of the at least two diffraction rings, and calculates residual perpendicular stresses in the respective directions in parallel to the surface of the measuring object OB from the obtained shapes of the diffraction rings by using a sinψ method. The biaxial residual stresses σx, σy, and τxy being parallel to the surface of the measuring object are calculated from the obtained residual perpendicular stresses in the respective directions.SELECTED DRAWING: Figure 2
申请公布号 JP2016090362(A) 申请公布日期 2016.05.23
申请号 JP20140224338 申请日期 2014.11.04
申请人 PULSTEC INDUSTRIAL CO LTD 发明人 MARUYAMA YOICHI
分类号 G01N23/20 主分类号 G01N23/20
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