发明名称 Method for providing charge protection to one or more dies during formation of a stacked silicon device
摘要 A method for providing charge protection to a die during formation of an integrated circuit, includes bonding the die to an interposer to form an unprotected stacked silicon component; encapsulating the unprotected stacked silicon component with a mold compound to cover at least a top surface of the die; grinding the mold compound to reduce a thickness of the mold compound; bonding a carrier wafer to the mold compound; removing the carrier wafer from the mold compound; and removing the mold compound from the top surface of the die after the carrier wafer is removed from the mold compound, to expose the top surface of the die.
申请公布号 US9385106(B1) 申请公布日期 2016.07.05
申请号 US201414444661 申请日期 2014.07.28
申请人 XILINX, INC. 发明人 Chaware Raghunandan;Singh Inderjit;O'Rourke Glenn;Hariharan Ganesh
分类号 H01L21/00;H01L23/00;H01L21/56;H01L21/304;H01L23/60 主分类号 H01L21/00
代理机构 代理人 Chan Gerald
主权项 1. A method for providing charge protection to a die during formation of an integrated circuit, comprising: bonding the die to an interposer to form an unprotected stacked silicon component; encapsulating the unprotected stacked silicon component with a mold compound to cover at least a top surface of the die; forming a protective component over the top surface of the die to form a protected stacked silicon component; bonding a carrier wafer to the protected stacked silicon component; removing the carrier wafer from the protected stacked silicon component; and removing the protective component from the top surface of the die after bumps are formed on the backside of the interposer and after the carrier wafer is removed from the protected stacked silicon component, to expose the top surface of the die.
地址 San Jose CA US