| 发明名称 | Polishing agent, polishing method and additive liquid for polishing | ||
| 摘要 | A polishing agent includes a particle of a metal oxide, a water-soluble polyamide, an organic acid and water. The water-soluble polyamide has a tertiary amino group and/or an oxyalkylene chain in a molecule thereof. The polishing agent has a pH of 7 or less. | ||
| 申请公布号 | US9481812(B2) | 申请公布日期 | 2016.11.01 |
| 申请号 | US201514808555 | 申请日期 | 2015.07.24 |
| 申请人 | ASAHI GLASS COMPANY, LIMITED | 发明人 | Yoshida Iori;Takagi Nobuyuki;Suzuki Masaru;Otsuki Toshihiko |
| 分类号 | C09G1/04;C08K3/22;C08L77/02;C08G73/02;C08L79/02;C08G69/40;H01L21/3105;H01L21/306 | 主分类号 | C09G1/04 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A polishing agent, comprising a particle of a metal oxide, a water-soluble polyamide having a tertiary amino group and/or an oxyalkylene chain in a molecule thereof, an organic acid and water, and having a pH of 7 or less. | ||
| 地址 | Chiyoda-ku JP | ||