发明名称 VAPOR DEPOSITION MASK MATERIAL, VAPOR DEPOSITION MASK MATERIAL FIXING METHOD, AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition mask material which can attain a vapor deposition mask capable of satisfying both a high definition and a weight saving even if large-sized, and which can be fixed firmly on a metal frame, and a fixing method capable of fixing that vapor deposition mask material firmly on the metal frame.SOLUTION: A vapor deposition mask material to be welded at a predetermined portion to a metal frame comprises: a metal mask formed with a slit; and a resin layer mounted on the metal mask. The resin layer does not exist on a surface of the metal mask corresponding to the predetermined portion.SELECTED DRAWING: Figure 1
申请公布号 JP2016211080(A) 申请公布日期 2016.12.15
申请号 JP20160175722 申请日期 2016.09.08
申请人 DAINIPPON PRINTING CO LTD 发明人 OBATA KATSUYA;KENMORI HIDESUKE;TAKEDA TOSHIHIKO
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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