发明名称 Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method
摘要 A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.
申请公布号 US9527936(B2) 申请公布日期 2016.12.27
申请号 US201514833245 申请日期 2015.08.24
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 Jain Vipul;LaBeaume Paul J.;Thackeray James W.;Cameron James F.;Coley Suzanne M.;Kwok Amy M.;Valeri David A.
分类号 G03F7/004;C08F22/10;C07C309/12;C07C381/12;C08F220/18;C08F220/24;C08F220/28;C08F220/38;G03F7/039;G03F7/20;G03F7/38;H01L21/027 主分类号 G03F7/004
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A polymer comprising, based on 100 mole percent of total repeat units, 60 to 100 mole percent of photoacid-generating repeat units, wherein each of the photoacid-generating repeat units comprises (a) photoacid-generating functionality and (b) base-solubility-enhancing functionality selected from the group consisting of tertiary carboxylic acid esters, secondary carboxylic acid esters wherein the secondary carbon is substituted with at least one unsubstituted or substituted C6-40 aryl, acetals, ketals, lactones, sultones, alpha-fluorinated esters, beta-fluorinated esters, alpha,beta-fluorinated esters, polyalkyleneglycols, alpha-fluorinated alcohols, and combinations thereof: wherein the photoacid-generating repeat units have the structurewherein R1 is independently in each of the repeat units H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; L1 is independently in each of the repeat units —O—, —C(O)—O—, unsubstituted C6-18 arylene, or substituted C6-18 arylene; m is independently in each of the repeat units 0 or 1; L2 is independently in each of the repeat units an unsubstituted or substituted C1-20 hydrocarbylene, wherein the substituted C1-20 hydrocarbylene can, optionally, include one or more in-chain divalent heteroatom-containing groups that is —O—, —S—, —NR2, —PR2—, —C(O)—, —OC(O)O—, —N(R2)C(O)—, —C(O)N(R2)—, —OC(O)N(R2)—, —N(R2)C(O)O—, —S(O)—, —S(O)2—, —N(R2)S(O)2—, —S(O)2N(R2)—, —OS(O)2—, or —S(O)2O—, wherein R2 is H or C1-12 hydrocarbyl; Z− is independently in each of the repeat units sulfonate (—SO3−), sulfonamidate, which is an anion of sulfonamide, —S(O)2N—R3, wherein R3 is H or unsubstituted or substituted C1-12 hydrocarbyl, or sulfonimidate, which is an anion of sulfonamide, —S(O)2N− S(O)2R3, wherein R3 is H or unsubstituted or substituted C1-12 hydrocarbyl; and Q+ is photoacid-generating cation; wherein at least one of L1, L2 (when m is 1), and Q+ comprises the base-solubility-enhancing functionality.
地址 Marlborough MA US