Ophthalmic measurement apparatus.

摘要

An ophthalmic measurement apparatus is provided in which a laser beam (3a) is converged at a selected point (P) in a measurement zone within an eye and light scattered therefrom is photoelectrically detected via a measurement mask (21) having an aperture (21a) of a prescribed size for ophthalmic measurement. During alignment the measurement zone is scanned at high speed by the laser beam (3a) with the same scanning width (H2) as the scanning width used during measurement. This makes it possible to observe any harmful light rays (A to D) that will actually appear during measurement at those settings and to align the apparatus so that the harmful light rays do not come within the limiting aperture of the measurement mask, thereby enabling measurement to be conducted under optimum conditions.