发明名称 Exposure apparatus, substrate processing system, and device manufacturing method
摘要 A first main body unit for supporting a substrate stage is supported at four points by vibration isolators, and a second main body unit is supported on the first main body unit at three points by second vibration isolators. This allows the first main body unit and the substrate stage to be supported stably with high rigidity, and for example, allows maintenance on the stage portion from the back side of the apparatus, which is not possible with the first main body unit supported at three points. Further, the apparatus comprises vibration isolation units connected in series in two platforms, which has a great effect of suppressing background vibration from the floor surface. Accordingly, exposure with high precision can be performed which improves the yield of devices, and the reduced maintenance time can improve the operation rate, consequently leading to an improvement in productivity of devices as end products.
申请公布号 US6853443(B2) 申请公布日期 2005.02.08
申请号 US20020310036 申请日期 2002.12.05
申请人 NIKON CORPORATION 发明人 NISHI KENJI
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/58;G03B27/62 主分类号 G03F7/20
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