| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a diffraction optical element capable of performing phase correction without adding an etching process and without being subjected to the restriction due to resolution ability of photolithography. SOLUTION: The method comprises: a first step (a) of etching a region of the seventh stair of a stepwise shape consisting of seven stairs and a region of the third stair of a stepwise shape consisting of three stairs in depth of 2L that is two times of a level difference of the stepwise shape; a second step (b) of etching a region of the second, fourth and sixth stairs of a stepwise shape consisting of seven stairs and a region of the first stairs of a stepwise shape consisting of three stairs in depth of L that is a level difference of the stepwise shape; a third step (c) of etching a region of the fifth, sixth and seventh stairs of a stepwise shape consisting of seven stairs and a region of the second and third stairs of a stepwise shape consisting of three steps in depth of 2L; and a fourth step (d) of etching a region of the third, fourth, fifth, sixth and seventh stairs of a stepwise shape consisting of seven stairs and a region of the second and third stairs of a stepwise shape consisting of three stairs in depth of 2L. COPYRIGHT: (C)2007,JPO&INPIT
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