发明名称 SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor apparatus wherein the influence of the breakage is reduced in the peeling stage. SOLUTION: After circuit blocks (composite units of thin film semiconductor devices formed for each function) are formed, they are arranged on a flexible substrate, and each circuit block is electrically connected. The circuit blocks are also laminated (a laminated structure). The above-mentioned structure improves the yield of this semiconductor apparatus and reduces the manufacturing cost thereof. The semiconductor apparatus is thereby miniaturized. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008047776(A) 申请公布日期 2008.02.28
申请号 JP20060223478 申请日期 2006.08.18
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 OKAMOTO TOMOHIRO
分类号 H01L21/02;H01L25/065;H01L25/07;H01L25/18;H01L27/12 主分类号 H01L21/02
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