POSITIONING DEVICE, LITHOGRAPHY DEVICE, AND SUBSTRATE POSITIONING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positioning device capable of suppressing a decrease in productivity of exposure devices to the minimum even when a foreign material exists in a measurement position of a notch part of a substrate.SOLUTION: A positioning device for positioning a circular substrate W including a notch Wn in an outer peripheral part comprises: moving means 1 for moving the substrate W in a radial direction of the substrate W; first measuring means Cb and Cc for measuring the position of the substrate W in the radial direction of the substrate W; calculating means for calculating a prescribed range on the width of the notch Wn on the basis of the position of the substrate W measured by the first measuring means Cb and Cc; and second measuring means Ca for measuring the width of the notch Wn of the substrate W. When the width of the notch Wn measured by the second measuring means Ca is within the prescribed range, the positioning device positions the substrate W in a circumferential direction of the substrate W. When the width of the notch Wn measured by the second measuring means Ca is not within the prescribed range, the positioning device moves the substrate W by the moving means 1 in the radial direction of the substrate W.SELECTED DRAWING: Figure 1