| 摘要 |
PROBLEM TO BE SOLVED: To provide a method to subject the same position to X-ray diffraction measurement over a long period by which measurement takes no unreasonably long time, the complexity of the measuring device can be minimized and accurate residual stress can be obtained even when the intensity of diffraction X-rays to be generated is weakened by removing a surface of a target object.SOLUTION: In the first X-ray diffraction measuring task (A), X-ray diffraction measurement is performed for a sufficient length of time while oscillating the housing of the X-ray diffraction measuring device after electro-polishing the surface of an object OB; next, after processing to microminiaturize the surface particle diameter of the object OB by sandblasting or otherwise, X-ray diffraction measurement is performed with the housing of the X-ray diffraction measuring device kept fixed; and the deviations Dev of residual stress among individual rounds of measurement are kept in memory. In the second and subsequent X-ray diffraction measuring tasks (B), X-ray diffraction measurement is performed with the housing of the X-ray diffraction measuring device kept fixed, and the residual stress obtained is corrected with the residual stress deviation Dev to acquire a normal residual stress.SELECTED DRAWING: Figure 1 |
