| 摘要 |
PURPOSE:To allow the formation of desired patterns by constituting the above method in such a manner that the mask generated with a defect only in the phase shifter part can be corrected and to eliminate the need for repeating the process for producing mask up to a light shielding material. CONSTITUTION:The phase shifter part 10 is formed by forming the pattern of the light shielding material 6 selectively on a mask substrate 1, depositing a permeable film 7 over the entire surface on the mask substrate 1, applying a negative resist 8 on the permeable film 6, exposing the negative resist 8 from the rear surface of the mask substrate to expose the resist and developing the resist, then etching the permeable film 7 with the remaining negative resist as a mask 9. |
