| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating apparatus by which the moving position of a movable part which moves for the treatment or the transport of substrates can be controlled with high degrees of accuracy, and to provide a method for measuring the amount of backlash. SOLUTION: A driving mechanism is provided with a stepping motor 1, a driving pulley 2 mounted on the axis of the motor, an idler pulley 3 and a timing belt 4 which is looped over between the driving pulley 2 and the idler pulley 3. A sector 6 for confirming position is mounted on the timing belt 4. A returning limit sensor 6 is disposed in the returning direction of the timing belt 4, and an advancing limit sensor 8 is disposed in the advancing direction. Prior to the operation of the driving mechanism, the stepping motor 1 is provided with the same number of driving pulses in both the forward and reverse directions. The difference between the moving amount in the advancing direction B of the timing belt 4 and that in the returning direction A is detected based on to the number of driving pulses of the stepping motor 1. |
