发明名称 DEVICE FOR REMOVING DEPOSIT
摘要 <P>PROBLEM TO BE SOLVED: To provide a device for removing deposits, which can electrically neutralize particles under easy-to-remove posture and can remove particles efficiently. Ž<P>SOLUTION: The device includes a tilt mechanism (rotation/tilt mechanism 14) for holding a substrate (wafer 10) and directing the extending direction of the substrate in the gravity direction, and an electrostatic discharging mechanism for electrically neutralizing an electrostatic charging state nearby the surface of the substrate by grounding the substrate to a zero potential after blowing gas electrostatically charged to the opposite polarity from the electrostatic charging polarity of the substrate and deposits. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010021180(A) 申请公布日期 2010.01.28
申请号 JP20080177676 申请日期 2008.07.08
申请人 NIKON CORP 发明人 ISHIBASHI KOICHI;YAMADA MASAYUKI
分类号 H01L21/02;H01L21/027 主分类号 H01L21/02
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