| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method capable of depositing a film of a high resolution pattern even when using a mask with openings having various shapes.SOLUTION: A film deposition method is a film deposition method depositing a film on a deposition object 13 by piling up a film deposition material in a film formation surface of the deposition object 13 through a plurality of openings of a mask 101. Furthermore, the method is constituted so as to deposit a film in the film formation surface of the film deposition object 13 through a plurality of openings of the mask 101 after repeatedly carrying out a stretching process for stretching mask beam portions 101a and 101b by mask stretching mechanisms 102a and 102c arranged in an outer peripheral part 101c of the mask 101 corresponding to the mask beam portions 101a and 101b forming openings of the mask 101, and an adsorbing process for magnetically adsorbing the mask 101 by a plurality of magnet pins 201a and 201b arranged corresponding to the mask beam portions 101a and 101b. |
