发明名称 MOS transistor and method for manufacturing MOS transistor
摘要 A novel MOS transistor, which includes a source region, a drain region, a channel region, an isolation region, a drift region, a gate dielectric layer, a gate electrode and a field plate, is provided. The gate electrode has a first portion and a second portion. The first portion of a first conductivity type is located over the channel region and has a width equal to or greater than a distance of the gate electrode overlapped with the channel region. The second portion is un-doped and located over the isolation region. Accordingly, the MOS transistor allows higher process freedom saves production cost, as well as improves reliability.
申请公布号 US9472665(B2) 申请公布日期 2016.10.18
申请号 US201314024872 申请日期 2013.09.12
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 Cheng Chih-Chang;Chu Fu-Yu;Liu Ruey-Hsin
分类号 H01L29/78;H01L21/28;H01L29/49;H01L29/66;H01L29/06;H01L29/40 主分类号 H01L29/78
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. A MOS transistor in a semiconductor substrate, the MOS transistor comprising: a source region of a first conductivity type and a drain region of the first conductivity type in the semiconductor substrate; a channel region of a second conductivity type opposite to the first conductivity type in the semiconductor substrate between the source region and the drain region; an isolation region adjacent to the drain region; a drift region of the first conductivity type laterally adjacent to the channel region and beneath the isolation region and the drain region; a gate dielectric layer over the channel region and extending over the drift region; a gate electrode over the gate dielectric layer having a first portion and a second portion, wherein the first portion of the first conductivity type has a uniform or substantially uniform dopant concentration and is over the channel region and further extends over a portion of the drift region and a portion of the isolation region, the second portion is un-doped and over the isolation region, an interface between the first portion and the second portion is directly overlying the isolation region, and the first portion has a width less than a width of the second portion; and a field plate contacting an upper surface of the gate electrode, wherein the field plate comprises polycide.
地址 Hsinchu TW