CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING ORGANIC PLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL

摘要

The present invention relates to a chemical vapor deposition starting material represented below that comprises an organic platinum compound in which a diimine, which includes two imines, and an alkyl anion are coordinated to divalent platinum. Diimine substituent groups R1-R4 are hydrogen atoms, alkyl groups or the like and all have a carbon number of 5 or less. The alkyl anions R5 and R6 are alkyl groups having a carbon number of 1-3, inclusive. The starting material of the present invention has high vapor pressure and a low decomposition temperature, thus enabling the production of a platinum thin film at low temperatures.