| 摘要 |
This method for producing chromium plated parts comprises immersing a plurality of workpieces in a chromium plating bath, and performing a plating treatment using a pulse current, to deposit, on the surface of the plurality of workpieces, a chromium plating layer which has compressive residual stress and in which cracks are inhibited. During a resting period in which the pulse current is not applied, a direct current is superposed which has a current density falling within a range which is the lower-limit current density for plating deposition or higher and which imparts compressive residual stress to the chromium plating layer. |
