CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING ORGANIC PLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL

摘要

The present invention relates to a chemical vapor deposition starting material represented below that comprises an organic platinum compound in which an alkenyl amine and alkyl anion are coordinated to divalent platinum. n is 1-5, inclusive. Alkenyl amine substituent groups R1-R5 are hydrogen atoms, alkyl groups or the like and all have a carbon number of 4 or less. The alkyl anions R6 and R7 are alkyl groups having a carbon number of 1-3, inclusive. The starting material of the present invention has high vapor pressure, enables production of a platinum thin film at low temperatures, and also exhibits appropriate thermal stability.