发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To increase the yield of a self-aligned heterojunction bipolar transistor by preventing a leveling. resist from peeling when a dummy layer 7 is etched. CONSTITUTION:A method is provided for manufacturing a self-aligned heterojunction bipolar transistor. When a self-aligned base is formed, a dummy layer 7 on an emitter mesa 50 is not completely covered with the base material.
申请公布号 JPH04275433(A) 申请公布日期 1992.10.01
申请号 JP19910037271 申请日期 1991.03.04
申请人 SHARP CORP 发明人 SATO HIROYA
分类号 H01L29/205;H01L21/28;H01L21/331;H01L29/73;H01L29/737 主分类号 H01L29/205
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