发明名称 |
Low power x-ray source with implantable probe for treatment of brain tumors |
摘要 |
An apparatus for treating a brain tumor in a patient, which includes an x-ray source of preselected or preprogrammed duration and intensity assembled in combination with a reference frame. The reference frame can be, for example, a stereotactic frame. The apparatus allows accurate positioning of the x-ray source within or adjacent to the desired region to be irradiated in the brain of the patient.
|
申请公布号 |
US5369679(A) |
申请公布日期 |
1994.11.29 |
申请号 |
US19920955494 |
申请日期 |
1992.10.02 |
申请人 |
PHOTOELECTRON CORPORATION |
发明人 |
SLISKI, ALAN P.;DINSMORE, MARK T.;BOOM, ANTHONIUS J.;ZERVAS, NICHOLAS T. |
分类号 |
A61N5/10;H01J35/00;H01J35/22;H01J35/32;H05G1/00;H05G1/06;H05G1/10;H05G1/20;H05G1/32;H05G1/34;(IPC1-7):H01J35/14 |
主分类号 |
A61N5/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|