Three-dimensional device layout with sub-groundrule features
摘要
Method for forming three-dimensional device structures comprising a second device having sub-groundrule features formed over a first device is disclosed. A layer having a single crystalline top surface is formed above the first device to provide the base for forming the active area of the second device. the sub-groundrule feature is formed using mandrel and spacers.
申请公布号
US5893735(A)
申请公布日期
1999.04.13
申请号
US19960742533
申请日期
1996.11.01
申请人
SIEMENS AKTIENGESELLSCHAFT;INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
STENGL, REINHARD J.;HAMMERL, ERWIN;MANDELMAN, JACK A.;HO, HERBERT L.;SRINIVASAN, RADHIKA;SHORT, ALVIN P.;POSCHENRIEDER, BERNHARD