发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A semiconductor device and a method for manufacturing the same are provided to reduce a manufacturing cost and to have high reliability. A method for manufacturing a semiconductor device comprises forming a bump(104) with a protrusion on an electrode pad(103), which is formed at a region corresponding to a semiconductor chip(101) of a substrate; forming an insulation layer(105) and a conductive layer on the substrate; pressurizing the conductive layer and rolling a front end of the protrusion exposed on the conductive layer; forming a conductive pattern(106) coupled to the bump by electrolytic plating; and rearranging the substrate.</p>
申请公布号 KR20080036925(A) 申请公布日期 2008.04.29
申请号 KR20070105325 申请日期 2007.10.19
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 MACHIDA YOSHIHIRO;YAMANO TAKAHARU
分类号 H01L23/48;H01L23/28 主分类号 H01L23/48
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