发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>A semiconductor device and a method for manufacturing the same are provided to reduce a manufacturing cost and to have high reliability. A method for manufacturing a semiconductor device comprises forming a bump(104) with a protrusion on an electrode pad(103), which is formed at a region corresponding to a semiconductor chip(101) of a substrate; forming an insulation layer(105) and a conductive layer on the substrate; pressurizing the conductive layer and rolling a front end of the protrusion exposed on the conductive layer; forming a conductive pattern(106) coupled to the bump by electrolytic plating; and rearranging the substrate.</p> |
申请公布号 |
KR20080036925(A) |
申请公布日期 |
2008.04.29 |
申请号 |
KR20070105325 |
申请日期 |
2007.10.19 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
MACHIDA YOSHIHIRO;YAMANO TAKAHARU |
分类号 |
H01L23/48;H01L23/28 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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