发明名称 |
METHOD FOR PROCESSING WAFER |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To secure the rigidity of a thin wafer before it is divided into pieces of devices in the device manufacturing process of semiconductor chip and the like having a re-wiring layer on a backside, and preferably form the re-wiring layer on the backside of the chip on a stage of the wafer. <P>SOLUTION: Only a region corresponding to a device formation region 4 where the semiconductor chip 3 is formed on the backside of the wafer 1 is thinned by polishing and etching to form a recess 11 on the backside. An annular salient 12 around the recess 11 allows the rigidity of the wafer 1 to be secured and handling of the wafer to be safely and easily performed at a time when the wafer is transferred to a process where a backside re-wiring layer 40 is formed. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2009021462(A) |
申请公布日期 |
2009.01.29 |
申请号 |
JP20070183935 |
申请日期 |
2007.07.13 |
申请人 |
DISCO ABRASIVE SYST LTD |
发明人 |
KAJIYAMA KEIICHI;ARAI KAZUNAO |
分类号 |
H01L21/3205;B24B1/00;H01L21/304;H01L23/12;H01L23/52 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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