发明名称 Alignment method, alignment system, product with alignment mark and device manufacturing method
摘要 The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. The alignment mark comprises a set of mutually parallel conductor tracks from which the diffracted radiation is collected, the pattern being defined by a pattern of variation of the pitch between successive tracks a function of position along the surface of the product. Thus, for example the pattern comprises alternating first and second areas wherein the pitch has a first and second value respectively. Because the tracks in the different parts of the pattern, such as the first and second areas, are parallel to each other improved measurements are possible.
申请公布号 EP2071402(A2) 申请公布日期 2009.06.17
申请号 EP20080171582 申请日期 2008.12.12
申请人 ASML NETHERLANDS BV 发明人 MUSA, SAMI;VAN HAREN, RICHARD JOHANNES FRANCISCUS;LALBAHADOERSING, SANJAYSINGH;XIUHONG, WEI
分类号 G03F9/00 主分类号 G03F9/00
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