发明名称 Imprint apparatus
摘要 An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.
申请公布号 US9400426(B2) 申请公布日期 2016.07.26
申请号 US201213603575 申请日期 2012.09.05
申请人 CANON KABUSHIKI KAISHA 发明人 Hamaya Zenichi;Hasegawa Noriyasu;Yoshida Setsuo;Shiode Yoshihiro
分类号 G03F7/00;B82Y10/00;B82Y40/00;B29C59/02 主分类号 G03F7/00
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. An imprint apparatus that molds an imprint material on a substrate using a mold and cures the imprint material to thereby form a pattern of the imprint material on the substrate, the imprint apparatus comprising: a mold holding mechanism configured to hold the mold; a substrate holding unit configured to hold the substrate; a deforming unit configured to deform the mold held by the mold holding mechanism into a convex shape toward the substrate; a measuring unit configured to obtain an image of a contact region at which the mold deformed into the convex shape is brought into contact with the imprint material; a driving unit configured to change a position of the contact region; and a control unit configured to calculate a plane coordinate of a centroid of the contact region based on the image and to control the operation of the driving unit based on the image acquired by the measuring unit during a releasing operation in which the mold is released from the imprint material such that the plane coordinate position of the centroid is directed toward a pre-acquired plane coordinate position of the center of a pattern-forming region on the substrate.
地址 Tokyo JP