| 发明名称 |
TWO-PHOTON ABSORBING MATERIAL |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a two-photon absorbing material that has a huge two-photon absorption cross-section area and exhibits two-photon absorption properties in a low concentration. <P>SOLUTION: The ethylene-based composition is represented by general formula (1) (R<SB>1</SB>-R<SB>8</SB>are each the same or different and a hydrogen atom, a 1-12C alkyl group or a 1-12C alkoxy group; R<SB>9</SB>and R<SB>10</SB>are each the same or different and a pyridyl group or a pyridinium base; n is an integer of 1-4). The two-photon absorbing material comprises the composition. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005132763(A) |
申请公布日期 |
2005.05.26 |
| 申请号 |
JP20030369795 |
申请日期 |
2003.10.30 |
| 申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
KAMATA KENJI;IWASE YOICHIRO;OTA KOJI;KONDO KOICHI |
| 分类号 |
C07D213/53;C09B23/00;C09B69/06 |
主分类号 |
C07D213/53 |
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