DEVICES FOR DEPOSITING THIN LAYERS ON A RUNNING FILM WEB, AND FILM WEB OR CUTS THEREOF

摘要

The invention relates to devices for depositing thin layers on a running film web (FB) under tensile stress and at an increased temperature using at least two self-limiting surface reactions (ALD/MLD). The device has at least one coating section (10) and multiple supply and discharge regions (13, 15, 17:18) along the coating section (10) for a reaction and flushing gas. According to the invention, the device comprises a measuring device (40) through which the film web (FB) that is still heated as a result of the coating process runs for ascertaining the oxygen- or nitrogen- or water vapor-permeability of the film web (FB) and of the thin layers (B) deposited on the film web. The invention also relates to a film web (FB) or cuts thereof labeled and/or coded with oxygen- or nitrogen- or water vapor-permeability values which are ascertained by such a device or derived therefrom.