发明名称 |
Vertical-gate-all-around devices and method of fabrication thereof |
摘要 |
Structures and methods are provided for forming bottom source/drain contact regions for nanowire devices. A nanowire is formed on a substrate. The nanowire extends substantially vertically relative to the substrate and is disposed between a top source/drain region and a bottom source/drain region. A first dielectric material is formed on the bottom source/drain region. A second dielectric material is formed on the first dielectric material. A first etching process is performed to remove part of the first dielectric material and part of the second dielectric material to expose part of the bottom source/drain region. A second etching process is performed to remove part of the first dielectric material under the second dielectric material to further expose the bottom source/drain region. A first metal-containing material is formed on the exposed bottom source/drain region. Annealing is performed to form a bottom contact region. |
申请公布号 |
US9478631(B2) |
申请公布日期 |
2016.10.25 |
申请号 |
US201414295388 |
申请日期 |
2014.06.04 |
申请人 |
Taiwan Semiconductor Manufacturing Company Limited |
发明人 |
Lin Cheng-Tung;Tsai Teng-Chun;Wang Li-Ting;Chen De-Fang;Peng Chih-Tang;Lin Hung-Ta;Wang Chien-Hsun;Huang Huang-Yi |
分类号 |
H01L29/66;H01L29/775;H01L27/092;H01L21/8238;B82Y10/00;B82Y40/00;H01L29/423;H01L29/06;H01L29/41 |
主分类号 |
H01L29/66 |
代理机构 |
Jones Day |
代理人 |
Jones Day |
主权项 |
1. A method for fabricating nanowire devices on a substrate, the method comprising:
forming a nanowire on a substrate, the nanowire extending substantially vertically relative to the substrate and being disposed between a top source/drain region and a bottom source/drain region; forming a first dielectric material layer on the bottom source/drain region; forming a second dielectric material layer on the first dielectric material layer; performing a first etching process to remove part of the first dielectric material layer and part of the second dielectric material layer to expose part of the bottom source/drain region; performing a second etching process to remove part of the first dielectric material layer and create an undercut between the substrate and the second dielectric material layer; forming a first metal-containing material on the bottom source/drain region through the undercut; and performing annealing on the first metal-containing material and the bottom source/drain region to form a bottom contact region. |
地址 |
Hsinchu TW |