发明名称 Liquid chemical for forming protecting film
摘要 Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.
申请公布号 US9478407(B2) 申请公布日期 2016.10.25
申请号 US201012912360 申请日期 2010.10.26
申请人 Central Glass Company, Limited 发明人 Saito Masanori;Arata Shinobu;Saio Takashi;Kumon Soichi;Nanai Hidehisa;Akamatsu Yoshinori
分类号 B08B3/08;H01L21/02;H01L21/027;C11D1/00;C11D1/04;C11D1/40;C11D11/00;H01L21/306 主分类号 B08B3/08
代理机构 Crowell & Moring LLP 代理人 Crowell & Moring LLP
主权项 1. A process for forming a water-repellent protecting film on a wafer comprising the steps of: a) conducting a surface treatment on a wafer having at its surface a finely uneven pattern formed with a recessed portion, wherein at least a part of the recessed portion of the wafer contains on the surface at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, with a liquid chemical comprising a water-repellant-protecting-film-forming agent for forming the water-repellent protecting film at least on the surface of the recessed portion, wherein the water-repellent-protecting-film-forming agent is a water-insoluble surfactant, wherein the water-insoluble surfactant is at least one kind selected from the group consisting of the following general formulas [1] to [6]: wherein R1 represents one of a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18 and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; and U represents a group selected from the group consisting of fluoro group, chloro group, bromo group and iodo group; R2R3R4N  [2] wherein R2 represents one of a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18 and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; R3 represents one of hydrogen atom, a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18, and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; and R4 represents one of hydrogen atom, a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18, and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; wherein R5 represents one of a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18, and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; V represents a sulfur atom; and W represents a group selected from the group consisting of a hydrogen atom, alkyl group, aromatic group, pyridyl group, quinolyl group, succinimide group, maleimide group, benzoxazole group, benzothiazole group and benzotriazole group, in which a hydrogen atom in these groups may be substituted with an organic group; R6(X)α  [4] wherein X represents one of isocyanate group, mercapto group and aldehyde group α represents an integer of from 1 to 6; R6 represents one of an organic group having hydrocarbon group whose carbon number is 1 to 18 and an organic group having a fluoroalkyl chain whose carbon number is 1 to 8; and where one of isocyanate group, mercapto group and aldehyde group of which number is α is substituted for the same number of hydrogen atom of R6; R7—Y   [5] wherein Y represents a ring structure containing sulfur element; R7 represents a group selected from the group consisting of a hydrogen atom, a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18, and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; wherein R8 represents one of a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18, and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; R9 represents one of a monovalent organic group having hydrocarbon group whose carbon number is 1 to 18, and a monovalent organic group having a fluoroalkyl chain whose carbon number is 1 to 8; and Z represents one of an oxygen atom and a sulfur atom; and salts thereof.
地址 Ube-shi JP