发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To provide a radiation sensitive resin compsn. having high resolution and high sensitivity, capable of forming a satisfactory resist pattern, also having such high acid resistance that the compsn. is not affected by an etching soln. and high adhesive property to a substrate and useful as a negative type photoresist. CONSTITUTION:This radiation sensitive resin compsn. contains novolak resin, a compd. capable of crosslinking the novolak resin, a radiation sensitive acid generating agent and at least one of epoxy resin and a silane coupling agent.
申请公布号 JPH0659444(A) 申请公布日期 1994.03.04
申请号 JP19920229442 申请日期 1992.08.06
申请人 JAPAN SYNTHETIC RUBBER CO LTD 发明人 MIYAMOTO HIDETOSHI;MIYASHITA SATOSHI;ISAMOTO YOSHITSUGU;MIURA TAKAO
分类号 G03F7/004;G03F7/028;G03F7/032;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
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