发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE:To provide a radiation sensitive resin compsn. having high resolution and high sensitivity, capable of forming a satisfactory resist pattern, also having such high acid resistance that the compsn. is not affected by an etching soln. and high adhesive property to a substrate and useful as a negative type photoresist. CONSTITUTION:This radiation sensitive resin compsn. contains novolak resin, a compd. capable of crosslinking the novolak resin, a radiation sensitive acid generating agent and at least one of epoxy resin and a silane coupling agent. |
申请公布号 |
JPH0659444(A) |
申请公布日期 |
1994.03.04 |
申请号 |
JP19920229442 |
申请日期 |
1992.08.06 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
MIYAMOTO HIDETOSHI;MIYASHITA SATOSHI;ISAMOTO YOSHITSUGU;MIURA TAKAO |
分类号 |
G03F7/004;G03F7/028;G03F7/032;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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