发明名称 ROTARY SURFACE PROCESSOR FOR SUBSTRATE
摘要 PURPOSE: To provide a device which can make effective use of installation space and becomes advantageous in the transfer operation of a substrate. CONSTITUTION: An outer cup 50 surrounds a cut 14 which prevents the splash of processing liquid supplied onto the surface of a substrate from scattering to surroundings, being arranged to surround the side and the downside of a substrate which rotates, being retained with a spin chuck 10. The outer cup 50 is made so that the plan form may be quadrangular, and each inner face of the peripheral wall 54 of the outer cup 50 is brought to contact with or close to the periphery of the cup 14. They are arranged so that clean air of down flow may be taken into the ventilation path 52 between the external periphery of the cup 14 and the inner side face of the peripheral wall of the outer cup 50.
申请公布号 JPH08321460(A) 申请公布日期 1996.12.03
申请号 JP19950152442 申请日期 1995.05.25
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YOSHIOKA KATSUJI;FUKUTOMI YOSHIMITSU
分类号 G03F7/16;B05C11/08;G03F7/30;H01L21/027;H01L21/306;(IPC1-7):H01L21/027 主分类号 G03F7/16
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