| 摘要 |
An electron beam exposure apparatus for scanning electron microscopy, which includes a main control unit; an electron gun for emitting an electron beam; a deflection amplifier connected to the main control unit for outputting a drive signal for controlling deflection conditions of the electron beam; a secondary electron detector; an A/D converter selectively connected either the deflection amplifier or the secondary electron detector for generating a digital signal; an image memory connected to the A/D converter and selectively to the main control unit such that the main control checks outputs of the deflection amplifier in response to outputs of the image memory.
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