发明名称 |
Single ELOG growth transverse p-n junction nitride semiconductor laser |
摘要 |
A vertical quantum well nitride laser-can be fabricated by ELOG (epitaxial lateral overgrowth), with the vertical quantum wells created by deposition over the vertical a-face of the laterally growing edges and forming the transverse junction in a single ELOG-MOCVD (metal organic chemical vapor deposition) growth step. Vertical quantum wells may be used for both GaN vertical cavity surface emitting lasers (VCSELs) and GaN edge emitting lasers.
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申请公布号 |
US2006284163(A1) |
申请公布日期 |
2006.12.21 |
申请号 |
US20050154010 |
申请日期 |
2005.06.15 |
申请人 |
BOUR DAVID P;CORZINE SCOTT W |
发明人 |
BOUR DAVID P.;CORZINE SCOTT W. |
分类号 |
H01L31/00 |
主分类号 |
H01L31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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