发明名称 Single ELOG growth transverse p-n junction nitride semiconductor laser
摘要 A vertical quantum well nitride laser-can be fabricated by ELOG (epitaxial lateral overgrowth), with the vertical quantum wells created by deposition over the vertical a-face of the laterally growing edges and forming the transverse junction in a single ELOG-MOCVD (metal organic chemical vapor deposition) growth step. Vertical quantum wells may be used for both GaN vertical cavity surface emitting lasers (VCSELs) and GaN edge emitting lasers.
申请公布号 US2006284163(A1) 申请公布日期 2006.12.21
申请号 US20050154010 申请日期 2005.06.15
申请人 BOUR DAVID P;CORZINE SCOTT W 发明人 BOUR DAVID P.;CORZINE SCOTT W.
分类号 H01L31/00 主分类号 H01L31/00
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