发明名称 PFCS GAS SCRUBBER WITH BOTH HIGH TEMPERATURE PLASMA DECOMPOSITION LAYER AND ABSORPTION.DECOMPOSITION LAYER
摘要 A PFCs(Perfluoro-Compounds) gas scrubber having both a high temperature plasma decomposition layer and an absorption/decomposition layer is provided to treat the PFCs gas and the acidic gas at the same time by treating the acidic gas in a canister when an acidic gas is generated in a process of treating PFCs gas in a high temperature plasma scrubber. In a scrubber having a high temperature plasma decomposition layer for treating PFCs gas, a PFCs gas scrubber having both a high temperature plasma decomposition layer and an absorption/decomposition layer is characterized in that a canister having an absorption/decomposition layer for treating gas exhausted from the scrubber is additionally installed. The canister has an adsorbent filling layer(12) installed therein, and includes perforated plates installed on a top part and a bottom part of the adsorbent filling layer respectively, a gas inflow port(15) installed under the lower perforated plate(11), and a gas exhaust port(16) installed on a top part of the canister above the upper perforated plate(13). The canister is made of stainless steel. The canister further has wheels(14) installed on a bottom face thereof.
申请公布号 KR20080033608(A) 申请公布日期 2008.04.17
申请号 KR20060099266 申请日期 2006.10.12
申请人 DONGBU ELECTRONICS CO., LTD. 发明人 OH, HYUN MYUNG
分类号 B01D53/32;B01D53/02 主分类号 B01D53/32
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