| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating device that can suppress coating liquid which is first discharged from a nozzle from being swelled and coated when starting coating processing even in a pressurization supply method, coat the liquid to an object to be coated from the time of starting the coating processing in a proper coating film thickness, has a simple structure and facilitates control for adjustment of the coating film thickness, and a coating method.SOLUTION: A coating device comprises: a coating liquid supply source 2 that pushes out and supplies coating liquid b stored in a tank 3 to a coating liquid supply system 9 by pressurization; a nozzle 12 that is connected to the coating liquid supply system, relatively moved to an object 11 to be coated while discharging the supplied coating liquid, and performs coating processing to the object to be coated; an opening/closing valve 13 that is provided in the coating liquid supply system, opened when starting the coating processing to supply the coating liquid to the nozzle, and then closed to stop the supply of the coating liquid to the nozzle; and a buffer tank 15 that is provided in the coating liquid supply system and has the coating liquid filled therein, and suppresses variation in pressure which is propagated toward the nozzle when the opening/closing valve is opened.SELECTED DRAWING: Figure 1 |
