发明名称 Apparatus, system, and method for wireless connection in integrated circuit packages
摘要 Some embodiments of the invention include a connecting structure between a support and at least one die attached to the support. The die includes a number of die bond pads on a surface of the die. The connecting structure includes a plurality of via and groove combinations. Conductive material is formed in the via and groove combinations to provide connection between the die bond pads and bond pads on the support. Other embodiments are described and claimed.
申请公布号 US9385094(B2) 申请公布日期 2016.07.05
申请号 US201514658743 申请日期 2015.03.16
申请人 Intel Corporation 发明人 Tang Jiamiao;Xu Henry;Sakamoto Shinichi
分类号 H01L23/538;H01L23/00;H01L25/065;H01L23/522;H01L23/50;H01L25/18 主分类号 H01L23/538
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. An apparatus comprising: a support including a support surface and a support bond pad on the support surface; a first die including a first die surface and a first die bond pad on the first die surface, wherein the first die is disposed on the support; a second die arranged in a stack with the first die, the second die including a second die surface and a second die bond pad on the second die surface; a third die arranged in a stack with the first, and the second dice, the third die including a third die surface and a third die bond pad on the third die surface; a connection coupled to the support bond pad and the first, second, and third die bond pads, wherein the connection includes a first segment coupled to the first die bond pad, a second segment coupled to the second die bond pad, a third segment coupled to the third die bond pad, a fourth segment coupled to the support bond pad, and a fifth segment coupled to each of the first, second, third, and fourth segments; and a dielectric located outside the first die, the second die, and the third die, wherein the dielectric contacts the first die surface, the second die surface, the third die surface, the support surface, and the first, second, third, fourth, and fifth segments of the connection, the dielectric including a first via, a second via, a third via, and a fourth via, the first segment located in the first via, the second segment located in the second via, the third segment located in the third via, and the fourth segment located in the fourth via.
地址 Santa Clara CA US