Gas-flow control method for plasma apparatus

摘要

A gas-flow control method for a plasma apparatus is provided. The gas-flow control method includes mounting a first adjusting mechanism on a gas-distribution plate. The gas-distribution plate includes a number of exhaust openings, and the exhaust openings in a first area of the gas-distribution plate are masked by the first adjusting mechanism. The gas-flow control method also includes exhausting a gas from the exhaust openings in a first unmasked area of the gas-distribution plate, and the gas passing through the first adjusting mechanism into a plasma chamber. The gas-flow control method further includes generating an electric field to excite the gas in the plasma chamber into plasma.

主权项

1. A gas-flow control method for a plasma apparatus, comprising:
mounting a first adjusting mechanism on a gas-distribution plate, the first adjusting mechanism having a shaft, an elongate arm and a masking element, the shaft being detachably disposed on the gas-distribution plate, the arm extending outwardly from the shaft and being rotatable about the shaft, the masking element extending outwardly from the arm, wherein the gas-distribution plate comprises a plurality of exhaust openings; positioning the masking element such that the exhaust openings in a first area of the gas-distribution plate are masked by the masking element of the first adjusting mechanism; exhausting a gas from the exhaust openings in a first unmasked area of the gas-distribution plate, and the gas passing through the first adjusting mechanism into a plasma chamber; and generating an electric field to excite the gas in the plasma chamber into plasma.