| 摘要 |
PROBLEM TO BE SOLVED: To stably obtain a plating film which can selectively remove an organic compound which causes defects in a plating solution, without reducing density of a useful additive, and in which haze or projection is not generated for a long period.SOLUTION: A plating device comprises: a plating tank; and an impurity removal mechanism which is connected so as to remove impurities from a plating solution in the plating tank or a plating solution which is supplied to the plating tank. The impurity removal mechanism comprises at least one of a carboxylic acid removal mechanism and an alcohol removal mechanism.SELECTED DRAWING: Figure 1 |
