发明名称 VAPOR-DEPOSITION MASK MANUFACTURING METHOD, VAPOR-DEPOSITION MASK MANUFACTURING DEVICE, LASER MASK, AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
摘要 Provided are a vapor-deposition mask manufacturing method with which it is possible to achieve a weight reduction regardless of an increase in size and form a vapor-deposition pattern having higher precision compared to conventional methods, and an organic semiconductor element manufacturing method with which it is possible to manufacture an organic semiconductor element having higher precision compared to conventional methods. The present invention comprises: a step for preparing a metal mask equipped with a resin plate, said metal mask being formed by laminating a resin plate and a metal mask having a slit; and a step for radiating a laser from the metal mask side to form an opening that corresponds to a pattern to be formed on the resin plate by vapor deposition. At the step for forming the opening, a laser mask is used and provided with an opening region corresponding to the opening and an attenuation region located on the periphery of the opening region and attenuating the energy of the radiated laser, whereby the laser passing through the opening region forms an opening that corresponds to the pattern to be formed on the resin plate by vapor deposition, and the laser passing through the attenuation region forms a thin portion around the opening of the resin plate.
申请公布号 WO2016125815(A1) 申请公布日期 2016.08.11
申请号 WO2016JP53145 申请日期 2016.02.03
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 MIYADERA YOSHIKO;NIRENGI TAKAYOSHI;TAKEDA TOSHIHIKO
分类号 C23C14/04;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/04
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