发明名称 |
composição de resina fotossensível, e, placa bruta para flexografia |
摘要 |
The present invention relates to a photosensitive resin composition comprising at least a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b), and a photopolymerization initiator (c), characterized in that the thermoplastic elastomer (a) comprises at least vinyl aromatic hydrocarbon units, butadiene units, and alkylene units and contains alkylene units not less than 5 wt% and not more than 80 wt% with respect to the total amount of butadiene units and alkylene units. The present invention provides a photosensitive resin composition that simultaneously achieves excellent fine line reproducibility, ester solvent resistance, and prevention of cracks occurring on plate surface. |
申请公布号 |
BRPI0614073(A2) |
申请公布日期 |
2016.11.01 |
申请号 |
BR2006PI14073 |
申请日期 |
2006.04.28 |
申请人 |
ASAHI KASEI CHEMICALS CORPORATION |
发明人 |
KAZUYOSHI, YAMAZAWA;KENJI, DOI;MASAHIRO, FUJIWARA;YOSHIFUMI, ARAKI |
分类号 |
G03F7/00;G03F7/033 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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