发明名称 Method for manufacturing semiconductor laser apparatus
摘要 On a mount surface portion of a semiconductor laser device, a first bonding layer is so formed that a first region near a light-emitting area is exposed. On a mount surface portion of a sub mount is formed a second bonding layer having a melting point T 2 lower than a melting point T 1 of the first bonding layer. The first and second bonding layers are heated in a mutually pressed state at a temperature T lower than the melting point T 1 of the first bonding layer but higher than the melting point T 2 of the second bonding layer (T 1 >T>T 2 ) to bond the semiconductor laser device to the sub mount. When the semiconductor laser device is bonded to the sub mount, the first region serves as the non-bonding area.
申请公布号 US6919216(B2) 申请公布日期 2005.07.19
申请号 US20040841008 申请日期 2004.05.07
申请人 SHARP KABUSHIKI KAISHA 发明人 KINEI SATOFUMI
分类号 H01L21/00;H01L21/44;H01L21/48;H01L21/50;H01L21/58;H01L21/603;H01S5/00;H01S5/02;H01S5/022;H01S5/024;H01S5/042;H01S5/40;(IPC1-7):H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址