| 摘要 |
<p>The invention concerns a cathode for vacuum sputtering treatment machine comprising a target plate (2) mounted on a support (3) arranged to act as cooler. The invention is characterized in that the support (3) is secured to a frame (5) defining a closed space (6) for positioning and centering the target (2), said frame (5) including peripherally a profiled catching rim (5d) designed to co-operate with an assembly of independent toe-in elements (8) having complementary catching shapes (8a) adapted to allow a tilting effect of said elements (8) producing a clamping action exerted on members (9), engaged in the thickness of the elements, and supported on part of the catching rim of the frame (5), such that under said tilting effect part of the catching shapes of the assembly of toe-in elements (8), is supported through the front on the peripheral rim of the target (2) for fixing it.</p> |
