| 摘要 |
PURPOSE:To produce a highly homogeneous, high purity ITO sintered compact at a low cost. CONSTITUTION:This ITO sintered compact consisting essentially of indium oxide and tin oxide is produced by: (1) mixing indium oxide and tin oxide powdery starting materials, then, sintering this powdery mixture in a compacted state to form a sintered compact, thereafter, pulverizing the resultant sintered compact with an autogenous mill into powder and re-sintering the powder; or alternatively, (2) removing the deposits on the surface of an ITO target after using it for film formation by a sputtering method, thereafter, pulverizing the resulting target with an autogenous mill into a powder and then, sintering the powder. |
