发明名称 Method for manufacturing semiconductor devices
摘要 A method of continuous manufacture of semiconductor integrated circuits, said method and apparatus adapted to contain the semiconductor substrate, semiconductor deposition coating processes, and etching processes within a substantially collocated series of process chambers so that the semiconductor travels from one chamber to the next without exposure to airborne impurities and contact with manufacturing personnel. The invention has particular utility in the high volume fabrication of large surface area semiconductor circuits such as active matrix liquid crystal displays. The present invention contains a roll-to-roll and continuous belt embodiment.
申请公布号 US5563095(A) 申请公布日期 1996.10.08
申请号 US19940353206 申请日期 1994.12.01
申请人 FREY, JEFFREY 发明人 FREY, JEFFREY
分类号 H01L21/00;(IPC1-7):H01L21/22 主分类号 H01L21/00
代理机构 代理人
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