PRODUCTION OF PHOTORESIST COATINGS

摘要

The invention relates to a method for the production of a resist coating wherein (a) a substrate is coated with a resist composition containing at least one component that absorbs radiation in the near infrared area by heating the coating and (b) the resist composition or a composition derived therefrom and obtained during the method is subjected at least once to therm al treatment during said method with the aid of radiation in the near infrared area.