POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive electron beam or X-ray resist composition having high sensitivity and high resolving power, ensuring diminished development defects and excellent also in suitability to coating (intrasurface uniformity). SOLUTION: The positive electron beam or X-ray resist composition contains (a) a compound which generates an acid when irradiated with electron beams or X-rays, (b) an alkali-soluble resin containing specified structural units and (c) a compound having a cationic polymerizing function.