| 摘要 |
A substrate loading/unloading device and a method for a semiconductor cleaning apparatus are provided to prevent a semiconductor wafer from being contaminated by a handle when the wafer is unloaded. A semiconductor wafer to be cleaned is loaded in a semiconductor cleaning apparatus by a substrate loading/unloading device, or a cleaned wafer is unloaded from the semiconductor cleaning apparatus by the substrate loading/unloading device. The substrate loading/unloading device has a first support surface supporting the wafer to be loaded and a second support surface supporting the wafer to be unloaded. The first and second support surfaces have a handle(5), a handle fixing part(4) and a turnover driving part(3) turning the handle fixing part at 180 degrees. The handle has semiconductor wafer support bosses on the first and second support surfaces.
|
