发明名称 |
TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS |
摘要 |
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.
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申请公布号 |
US2008032228(A1) |
申请公布日期 |
2008.02.07 |
申请号 |
US20060462527 |
申请日期 |
2006.08.04 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KHOJASTEH MAHMOUD;HUANG WU-SONG;LAWSON MARGARET C.;PATEL KAUSHAL S.;POPOVA IRENE;VARANASI PUSHKARA R. |
分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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